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Physical Properties of SiO2 Layers Deposited at Room Temperature by a Combination of ECR Plasma and High-Speed Jet of Silane

著者名:
Isai, G.
Holleman, J.
Woerlee, P.
Wallinga, H.
Modreanu, M.
Cobianu, C.
さらに 1 件
掲載資料名:
Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-8
発行年:
2003
開始ページ:
609
終了ページ:
616
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773782 [1566773784]
言語:
英語
請求記号:
E23400/200308
資料種別:
国際会議録

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