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Characteristics of Tungsten Carbide Films Prepared by Plasma Assisted Atomic Layer Deposition using Bis (TerT-Butylimido) Bis (Dimethylamido)Tungsten

著者名:
Kim, D.
Kim, Y.
Song, Y.
Lee, B.
Kim, J.
Suh, S.
Gordon, R.
さらに 2 件
掲載資料名:
Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-8
発行年:
2003
開始ページ:
491
終了ページ:
502
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773782 [1566773784]
言語:
英語
請求記号:
E23400/200308
資料種別:
国際会議録

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