Blank Cover Image

Achieving Low Junction Capacitance on Bulk Si MOSFET Using SDOI Process*

著者名:
掲載資料名:
ULSI Process Integration : proceedings of the International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-6
発行年:
2003
開始ページ:
266
終了ページ:
277
総ページ数:
12
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773768 [1566773768]
言語:
英語
請求記号:
E23400/200306
資料種別:
国際会議録

類似資料:

1 国際会議録 A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions

Cohen, G.M., Cabral, C., Jr., Lavoie, C., Solomon, P.M., Guarini, K.W., Chan, K.K., Roy, R.A.

Materials Research Society
7 国際会議録 Unibond SOI wafers achieved by Smart-Cut process

Bruel, M., Aspar, B., Maleville, C., Moriceau, H., Auberton-Herve, A.J., Barge, T.

Electrochemical Society
2 国際会議録 Ultra-Shallow Raised p+n Junctions with Self-Aligned Titanium Silicide Contacts Formed by Boron Outdiffusion from Selectively Deposited Silicon Epitaxial Layers

Shih, H. T., Violette, K. E., Ozturk, M. C.

MRS - Materials Research Society
8 国際会議録 Unibond SOI Wafers Achieved by Smart-Cut Process

Bruel, M., Aspar, B., Maleville, C., Moriceau, H., Auberton-Herve, A.J., Barge, T.

Electrochemical Society
3 国際会議録 GaAs MOSFET - Achievements and Challenges

Hong, M., Baillargeon, J.N., Kwo, J., Kortan, A.R., Mannaerts, J.P., Cho, A.Y., Wang, Y.C., Ren, F.

Electrochemical Society
9 国際会議録 Investigation of Fabrication Process for n+/p Junction for Germanium n-channel MOSFETs

M. Koike, Y. Kamata, T. Ino, D. Hagishima, M. Koyama

Electrochemical Society
4 国際会議録 On the Effects of Carrier Tunneling on the Capacitance-Voltage Characteristics of Ultrathia-Oxide MOSFETs

M. Y. C. Shea, J. Jopling, H. Z. Massoud

Electrochemical Society
10 国際会議録 Formation and Characterization of NiSi-Silicided n+-p Shallow Junctions Using Implantation Through Sulcide and Low Temperature Furnace Annealing

Wang, C.-C., Chen, M.-C.

Electrochemical Society
5 国際会議録 Advances in GaAs MOSFET's using Ga2O3(Gd2O3) as gate oxide

Wang, Y.C., Hong, M., Kuo, J.M., Mannaerts, J.P., Kwo, J., Tsai, H.S., Krajewski, J.J., Weiner, J.S., Chen, Y.K., Cho, …

Materials Research Society
11 国際会議録 Low Temperature Selective Si Epitaxy Using Si2H6 and Cl2: Investigations into Selectivity Robustness and Epitaxial Film Quality

O'Neil, Patricia A., Violette, Katherine E., Ozturk, Mehmet C., Batchelor, Dale, Maher, Dennis M.

MRS - Materials Research Society
6 国際会議録 Josephson Effect in Low-Capacitance Tunnel Junctions

Tinkham M.

Plenum Press
12 国際会議録 Maximization of process window for low-k1 spacing using KrF lithography

Fu, S.-C., Kuo, C.-S., Shiu, F.-J., Chen, J.-J., Tsia, C.-S., Ho, C.-T., Wang, C.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12