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Low-Temperature Oxidation for Gate Dielectrics of Poly-Si TFTs using High-Density Surface Wave Plasma

著者名:
掲載資料名:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-2
発行年:
2003
開始ページ:
614
終了ページ:
621
総ページ数:
8
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773478 [1566773474]
言語:
英語
請求記号:
E23400/200302
資料種別:
国際会議録

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