Decoupled Plasma Nitridation of Ultra-Thin Gate Oxides for 60-90 nm Technologies
- 著者名:
Bidaud, M. Carrere, J.-P. Bocuf, F. Dachs, C. Parthasarathy, C. Guyader, F. - 掲載資料名:
- Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2003-2
- 発行年:
- 2003
- 開始ページ:
- 517
- 終了ページ:
- 524
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773478 [1566773474]
- 言語:
- 英語
- 請求記号:
- E23400/200302
- 資料種別:
- 国際会議録
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