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Scaling Issues for Advanced SOI Devices: Gate Oxide Tunneling, Thin Buried Oxide, and Ultra-Thin Films

著者名:
Pretet, J.
Ohata, A.
Dieudonne, F.
Allibert, F.
Bresson, N.
Matsumoto, T.
Poiroux, T.
Jomaah, J.
Cristoloveanu, S.
さらに 4 件
掲載資料名:
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2003-2
発行年:
2003
開始ページ:
476
終了ページ:
487
総ページ数:
12
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773478 [1566773474]
言語:
英語
請求記号:
E23400/200302
資料種別:
国際会議録

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