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On Gas-Phase Depletion During LPCVD of GeSi Films using GeH4/SiH4 and GeH4ISi2H6 Gas Sources

著者名:
掲載資料名:
Thin Film Transistor Technologies VI : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-23
発行年:
2002
開始ページ:
216
終了ページ:
223
総ページ数:
8
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773850 [1566773857]
言語:
英語
請求記号:
E23400/200223
資料種別:
国際会議録

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