Plasma-Surface Kinetics and Feature Profile Evolution in Cl2 + HBr Etching of Poly-silicon

Plasma-Surface Kinetics and Feature Profile Evolution in Cl2 + HBr Etching of Poly-silicon

著者名:

掲載資料名:

Plasma processing XIV : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2002-17

発行年:

2002

開始ページ:

71

終了ページ:

83

総ページ数:

13

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773416 [1566773415]

言語:

英語

請求記号:

E23400/200217

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014050
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Centennial Meeting of the Electrochemical Society
回次:	14th ; 201st
会議開催地:	Philadelphia, PA, USA
会議開催年:	2002.05.12-2002.05.17

類似資料:

1 国際会議録 Feature Profile Evolution during the High Density Plasma Etching of Patterned Polysilicon Mahorowala, A.P., Sawin, H.H. Electrochemical Society	7 国際会議録 Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase Muscat, A.J., Lawing, A.S., Xu, H., Sawin, H.H. American Institute of Chemical Engineers
2 国際会議録 Etching vs Deposition: The Effect on Profiles and Etching Yield Curves for Oxide Etching Kwon, O., Jin, W., Sawin, H.H. Electrochemical Society	8 国際会議録 Feature Profile Evolution using Level Set Methods Hwang, H.H. Electrochemical Society
3 国際会議録 Profile Evolution Simulation of High Density Plasma Etching of Patterned Polysilicon Mahorowala, A.P., Chang, J.P., Sawin, H.H. Electrochemical Society	9 国際会議録 UV/CL2 ETCHING AND CLEANING OF WAFER SURFACES Lawing, A. Scott, Muscat, Anthony J., Sawin, Herbert H., Butterbaugh, Jeffrey W. Electrochemical Society
4 国際会議録 310d. 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching Wei Guo, Hiroyo Kawai, Herbert H. Sawin American Institute of Chemical Engineers	10 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN HF VAPOR PROCESSES Han, Y.-P., Lawing, S., Sawin, H. Electrochemical Society
5 国際会議録 Deep Reactive Ion Etching of Silicon Ayon, A.A., Chen, K-S., Lohner, K.A., Spearing, S.M., Sawin, H.H., Schmidt, M.A. Materials Research Society	11 国際会議録 In-Situ Study of the Perturbed Layer Formed During Silicon Etching in Cl2 and HBr Low-Pressure, High Density Plasmas Vallon, S., Vallier, L. Electrochemical Society
6 国際会議録 On End Point Detection of Plasma Etching via Optical Emission Interferometry Wong, K.S., Boning, D.S., Sawin, H.H. Electrochemical Society	12 国際会議録 PARAMETRIC CHARACTERIZATION OF PLASMA ETCHING PROCESSES Mocella, M. T., Jenkins, M. W., Sawin, H. H., Allen, K. D. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12