Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process

Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process

著者名:

Kwon, O. ( (Massachusetts Institute of Technology) )
Sawin, H. ( (Massachusetts Institute of Technology) )

掲載資料名:

Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2002-15

発行年:

2002

開始ページ:

166

終了ページ:

179

総ページ数:

14

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773379 [1566773377]

言語:

英語

請求記号:

E23400/200215

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014049
シリーズID:	PA00000028
会議名:	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
回次:	5th ; 201st
会議開催地:	Philadelphia, PA, USA
会議開催年:	2002.05.00

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