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A Study of Boron Diffusion from Selectively Grown Epitaxial Silicon-Germanium into Silicon During Rapid Thermal Annealing

著者名:
Yang, T.H.
Chang, E.Y.
Chen, K.M.
Chien, C.H.
Huang, H.J.
Yang, T.Y.
Chang, C.Y.
さらに 2 件
掲載資料名:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-11
発行年:
2002
開始ページ:
371
終了ページ:
380
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
言語:
英語
請求記号:
E23400/200211
資料種別:
国際会議録

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