INVITED: LOW VOLTAGE GATE DIELECTRIC RELIABILITY

INVITED: LOW VOLTAGE GATE DIELECTRIC RELIABILITY

著者名:

掲載資料名:

Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2002-2

発行年:

2002

開始ページ:

465

終了ページ:

474

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773744 [1566773741]

言語:

英語

請求記号:

E23400/2002-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014036
シリーズID:	PA00000028
会議名:	International Symposium on Silicon Materials Science and Technology
回次:	9th
会議開催地:	Philadelphia, PA, USA
会議開催年:	2002.05.13-2002.05.17

類似資料:

1 国際会議録 INVITED: LOW VOLTAGE GATE DIELECTRIC RELIABILITY Weir, B.E., Alam, M.A., Silverman, P.J., Ma, Y. Electrochemical Society	7 国際会議録 Hyperthermal Nitridation for Ultrathin Silicon Oxynitride Gate Dielectrics Krug, C., Baumvol, I.J.R., Stedile, F.C., Green, M.L., Klemens, F., Silverman, P.J., Sorsch, T.W., Alvarez, F., Hammer, … Electrochemical Society
2 国際会議録 Relationship Between Interfacial Roughness and Dielectric Reliability for Silicon Oxynitride Gate Dielectrics Processed With Nitric Oxide Sapjeta, J., Green, M. L., Chang, J. P., Silverman, P. J., Sorsch, T. W., Weir, B. E., Gladden, W., Ma, Y., Sung, C. Y., … MRS - Materials Research Society	8 国際会議録 RTA Processing of W-Polycide Dual-Gate Sub-Micron Structures for Low-Voltage CMOS Technology Bevk, J., Furtsch, M., Georgiou, G. E., Hillenius, S. J., Schielein, D., Schiml, T., Silverman, P. J., Luftman, H. S. MRS - Materials Research Society
3 国際会議録 Physics and Prospects of Sub-2 urn Oxides Alam, M.A., Weir, B., Silverman, P., Bude, J., Chetti, A., Ma, Y., Brown, M.M., Hwang, D., Hamad, A. Electrochemical Society	9 国際会議録 Low-voltage organic electro-optic modulators using transparent conducting oxides as electrodes (Invited Paper) [5935-33] Xu, G., Ma, J., Liu, Z., Liu, B., Ho, S., Zhu. P., Wang, L., Yang, Y., Marks, T. J., Luo, J., Tucker, N. M., Jen, A. K. … SPIE - The International Society of Optical Engineering
4 国際会議録 Performance and Reliability of Scaled Gate Dielectrics Paulson, W. M., Tobin, P. J., Tseng, H-H., Maiti, B., Gelatos, C., Hegde, R. I., Anderson, S. G. H. MRS - Materials Research Society	10 国際会議録 Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper) Hattangady,S.V., Grider,O.T., Kraft,R., Shiau,W.-T., Douglas,M.A., Nicollian,P., Rodder,M., Brown,G.A., Chatterjee,A., … SPIE-The International Society for Optical Engineering
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6 国際会議録 Soft Breakdown in Ultrathin Oxides Weir, B. E., Silverman, P. J., Alers, G. B., Monroe, D., Alam, M. A., Sorsch, T. W., Green, M. L., Timp, G. L., Ma, Y., … MRS - Materials Research Society	12 国際会議録 Low-voltage organic thin film transistors and circuits with molecular gate dielectrics (Invited Paper) [5940-32} Halik, M. SPIE - The International Society of Optical Engineering

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