GROWTH OF 300mm SILICON SINGLE CRYSTALSIN A 24' HOT ZONE
- 著者名:
Tu, H. Daj, X. Wu, Z. Zhang, G. Wang, J. Fang, F. Zhou, Q. Xiao, Q. - 掲載資料名:
- Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2002-2
- 発行年:
- 2002
- 開始ページ:
- 182
- 終了ページ:
- 188
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773744 [1566773741]
- 言語:
- 英語
- 請求記号:
- E23400/2002-2
- 資料種別:
- 国際会議録
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5
国際会議録
STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
6
国際会議録
STUDY ON GEOMETRY, SURFACE DAMAGE AND RAPID THERMAL ANNEALING OF 300mm AS-CUT SILICON WAFERS
Electrochemical Society |
SPIE-The International Society for Optical Engineering |