EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY

EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY

著者名:

掲載資料名:

Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-26

発行年:

2001

開始ページ:

156

終了ページ:

163

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773591 [1566773598]

言語:

英語

請求記号:

E23400/200126

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014030
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	7th ; 2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.09.00

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