REMOVAL OF PHOTORESIST BY 03 DI-WATER PROCESSES: DETERMINATION OF DEGRADATION PRODUCTS

REMOVAL OF PHOTORESIST BY 03 DI-WATER PROCESSES: DETERMINATION OF DEGRADATION PRODUCTS

著者名:

Vankerckhoven, H.

掲載資料名:

Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-26

発行年:

2001

開始ページ:

77

終了ページ:

84

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773591 [1566773598]

言語:

英語

請求記号:

E23400/200126

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014030
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	7th ; 2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.09.00

類似資料:

1 国際会議録 THE REMOVAL OF ORGANIC CONTAMINATION BY 03/DI-WATER PROCESSES: A THEORETICAL STUDY De Smedt, F., Vankerckhoven, H., Vinckier, C., De Gendt, S., Claes, M., Heyns., M. Electrochemical Society	7 国際会議録 APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR Wolke, K., Riedel, T., Haug, R., De Gendt, S., Heyns, M.M., Meuris, M. Electrochemical Society
2 国際会議録 A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS De Smedt, F., De Gendt, S., Cornelissen, I., Heyns, M.M., Vinckier, C. Electrochemical Society	8 国際会議録 MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING Xu, K., Vos, R., Vereecke, G., Mertens, P., Heyns, M., Vinckier, C., Fransaer, J. Electrochemical Society
3 国際会議録 OZONATED HF APPLICATIONS IN A SPRAY PROCESSING Claes, M., Rohr, E., De Gendt, S., Lagrange, S., Bergman, E., Heyns, M. Electrochemical Society	9 国際会議録 INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING De Gendt, S., Beckx, S., Caymax, M., Claes, M., Conard, T., Delabie, A., Deweerd, W., Hellin, D., Kraus, H., Onsia, B., … Electrochemical Society
4 国際会議録 Organic contamination: impact, characterization, sources and cleaning during IC manufacturing Claes, M., De Gendt, S. Electrochemical Society	10 国際会議録 EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION Kenens, C., De Gendt, S., Knotter, D.M., Loewenstein, L.M., Meuris, M., Vandervorst, W., Heyns, M.M. Electrochemical Society
5 国際会議録 Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon Elshocht, S.Van, Caymax, M., Gendt, S.De, Conard, T., Petry, J., Claes, M., Witters, T., Zhao, C., Brijs, B., Richard, … Materials Research Society	11 国際会議録 High-k Dielectrics Integration Prospects (Invited paper) Kubicek, S., Van Elshocht, S., Delabie, A., Yamamoto, K., Beckx, S., Claes, M., Van Hoornick, N., Kwak, D.-H., Hyun, S., … Electrochemical Society
6 国際会議録 EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS De Gendt, S., Lux, M., Claes, M., Van Hoeymissen, J., Conrad, T., Worth, W., Lagrange, S., Bergman, E., Jassal, A.S., … Electrochemical Society	12 国際会議録 THE IDENTIFICATION AND DEGRADATION OF ISOSACCHARINIC ACID, A CELLULOSE DEGRADATION PRODUCT Greenfield, B. F., Holtom, G. J., Hurdus, M. H., O'Kelly, N., Pilkington, N. J., Rosevear, A., Spindler, M. W., … MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12