Patterning with 193 nm Resists | 東京工業大学附属図書館文献データベース

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Patterning with 193 nm Resists

著者名:

Dorris, S.-T.L.

さらに 4 件

掲載資料名:

Thin film materials, processes, and reliability : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-24

発行年:

2001

開始ページ:

31

終了ページ:

41

総ページ数:

11

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773577 [1566773571]

言語:

英語

請求記号:

E23400/200124

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014028
シリーズID:	PA00000028
会議名:	International symposium on thin film materials, processes, and reliability ; Meeting of The Electrochemical Society ; Annual Meeting of the International Society of Electrochemistry
回次:	2001 ; 200th ; 52nd
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.09.02-2001.09.07

類似資料:

1 国際会議録 Patterning 180 nm Copper Oxide Dual Damascene Baseline with 193 nm Resists Bakshi, V., Smith, O. Electrochemical Society	7 国際会議録 Reactive ion etching of 193-nm resist candidates: current platforms and future requirements Wallow,T.I., Brock,P.J., DiPietro,R.A., Allen,R.D., Opitz,J., Sooriyakumaran,R., Hofer,D.C., Meute,J., Byers,J.D., … SPIE-The International Society for Optical Engineering
2 国際会議録 Sumitomo resist on various BARC substrates using SVGL micrascan 193 Rajaratnam,M.M., Baxter,G.H., Riggs,M., Tasaico,P., Zimmerman,J.D., Beach,J.V., Holland,P., Morris,C., Spurlock,K. SPIE-The International Society for Optical Engineering	8 国際会議録 Optical extension at the 193-nm wavelength Zandbergen,P., McCallum,M., Amblard,G.R., Domke,W.-D., Smith,B .W., Zavyalova,L., Petersen,J.S. SPIE - The International Society for Optical Engineering
3 国際会議録 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering	9 国際会議録 Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications Klerk, J., Jorritsma, L., Setten, E., Droste, R., Jongh, R.C., Hansen, S.G., Smith, D., Kerkhof, M.A., Mast, F., … SPIE-The International Society for Optical Engineering
4 国際会議録 Methacrylate resists and antireflective coatings for 193-nm lithography Taylor, G. N., Trefonas, P., Szmanda, C. R., Barclay, G. G., Kavanagh, R. J., Blacksmith, R. F., Joesten, L. A., … SPIE - The International Society of Optical Engineering	10 国際会議録 Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C. SPIE-The International Society for Optical Engineering
5 国際会議録 Pattern collapse in high-aspect-ratio DUV and 193-nm resists Domke,W.D., Graffenberg,V.L., Patel,S., Rich,G.K., Cao,H.B., Nealey,P.F. SPIE - The International Society for Optical Engineering	11 国際会議録 Solution to resist poisoning in the integration of 248- and 193-nm photoresists with low-k dielectric materials Satyanarayana, S., Brennan, K., Jacobs, T., Berger, R. SPIE-The International Society for Optical Engineering
6 国際会議録 A new 193nm resist Hirayama, T., Shiono, D., Matsumaru, S., Ogata, T., Hada, H., Onodera, J., Arai, T., Sakamizu, T., Yamaguchi, A., … SPIE - The International Society of Optical Engineering	12 国際会議録 Novel polymers for 193-nm single-layer resist based on cycloolefin polymers Kim,H.-W., Lee,S.-H., Kwon,K.-Y., Jung,D.-W., Lee,S., Yoon,K.-S., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE - The International Society for Optical Engineering

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