Model Based Optical Proximity Correction For 0.12 UM Memory Process With ARF Lithography

Model Based Optical Proximity Correction For 0.12 UM Memory Process With ARF Lithography

著者名:

掲載資料名:

Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-17

発行年:

2001

開始ページ:

331

終了ページ:

338

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773508 [1566773504]

言語:

英語

請求記号:

E23400/200117

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014021
シリーズID:	PA00000028
会議名:	International Conference on Semiconductor Technology - ISTC
回次:	1st (2001)
会議開催地:	Shanghai, China
会議開催年:	2001.05.27-2001.05.30

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