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* Ultra Thin High-K Dielectrics Grown by Atomic Layer Deposition: A Comparative Study of ZrO2, HfO2, Y2O3 and Al2O3

著者名:
Gusev, E.P.
Canter, E.
Copel, M.
Gribelyuk, M.
Buchanan, D.A.
Okorn-Schmidt, H.
D'Emic, C.
Kozlowski, P.
Tuominen, M.
Linnermo, M.
Haukka, S.
さらに 6 件
掲載資料名:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-9
発行年:
2001
開始ページ:
189
終了ページ:
196
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
言語:
英語
請求記号:
E23400/2001-9
資料種別:
国際会議録

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