Preparation of Sub 20A Thick Ultra-Thin Stack Gate Dielectrics by In-situ RTCVD Processes
- 著者名:
- 掲載資料名:
- Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-9
- 発行年:
- 2001
- 開始ページ:
- 183
- 終了ページ:
- 188
- 総ページ数:
- 6
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773157 [1566773156]
- 言語:
- 英語
- 請求記号:
- E23400/2001-9
- 資料種別:
- 国際会議録
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