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Multiple Spike RTP Process for Forming Ultra Thin Oxides for MOS Gate Dielectric Application

著者名:
Das, J.H.
Jia, Y.B.
Choi, J.Y.
Daniel, A.D.
Atanos, A.J.
Tay, S.P.
さらに 1 件
掲載資料名:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-9
発行年:
2001
開始ページ:
147
終了ページ:
156
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
言語:
英語
請求記号:
E23400/2001-9
資料種別:
国際会議録

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