Effect of Oxygen in Deposited Ultra Thin Silicon Nitride Film on Electrical Properties
- 著者名:
- 掲載資料名:
- Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-7
- 発行年:
- 2001
- 開始ページ:
- 264
- 終了ページ:
- 273
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773133 [156677313X]
- 言語:
- 英語
- 請求記号:
- E23400/2001-7
- 資料種別:
- 国際会議録
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1
国際会議録
Optimum Structure of Deposited Ultra Thin Silicon Oxynitride Film to Minimize Leakage Current
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