Thermally Induced Stress Changes in High Density Plasma Deposited Silicon Nitride Films

Thermally Induced Stress Changes in High Density Plasma Deposited Silicon Nitride Films

著者名:

掲載資料名:

Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-7

発行年:

2001

開始ページ:

253

終了ページ:

263

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773133 [156677313X]

言語:

英語

請求記号:

E23400/2001-7

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014011
シリーズID:	PA00000028
会議名:	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
回次:	6th
会議開催地:	Washington, D.C., USA
会議開催年:	2001.03.25-2001.03.30

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