Blank Cover Image

Reduced Clean Time and PFC Emissions Reduction Through Remote Plasma Clean For Lamp Heated CVD Chambers

著者名:
Mendicino, L. ( (Motorola), )
Nauert, C. ( (Motorola), )
Brown, P.T. ( (Motorola), )
Golovato, S. ( (Motorola), )
Day, B. ( (Motorola), )
Atherton, A. ( (Applied Materials) )
Nowak, T. ( (Applied Materials) )
Silvetti, D. ( (Applied Materials) )
Hartz, C. ( (Air Products and Chemicals) )
Johnson, A. ( (Air Products and Chemicals) )
Maroulis, P. ( (Air Products and Chemicals) )
さらに 6 件
掲載資料名:
Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries : proceedings of the fourth International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-6
発行年:
2001
開始ページ:
15
終了ページ:
27
総ページ数:
13
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773126 [1566773121]
言語:
英語
請求記号:
E23400/2001-6
資料種別:
国際会議録

類似資料:

1 国際会議録 Evaluation of the Applied Materials Remote Clean TM Technology for Lamp Heated CVD Chambers for Perfluorocompound (PFC) Emissions Reduction

Mendicino, L., Nauert, C., Flood, J., Brown, P.T., Atherton, A., Nowak, T., Silvetti, D.

Electrochemical Society
7 国際会議録 Investigation of Chamber Cleaning Using PFC Remote Plasma

Wani, E., Sunada, T., Suzuki, S., Kosano, Y., Mitsui, Y., Takaichi, T., Beppu, T., Sekiya, A.

Electrochemical Society
2 国際会議録 PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans

Mendicino, L., Brown, P.T., Filipiak, S., Nauert, C., Estep, H., Fletcher, M.

Electrochemical Society
8 国際会議録 Continuous Real-Time Detection of Molecular Fluorine (F2) Emitted as a By-Product Of CVD and Etch Processes

Laush, C., Vartanian, V., Mendicino, L., Brown, P.T.

Electrochemical Society
3 国際会議録 Remote Plasma Clean Technology for Dielectric CVD Chamber Cleaning to Reduce PFC Emissions

Mendicino, L., Brown, P.T., Filipak, S., Loop, D., Basnett, R., Holber, W., Pearce, R., Johnson, A.

Electrochemical Society
9 国際会議録 Point of Use Abatement Unit By-Pass for NF3-Based CVD Chamber Clean Applications

Babbitt, D., Mendicino, L., Vartanian, V., Goolsby, B., Brown, P.T.

Electrochemical Society
4 国際会議録 Optimization of a C2F6 Clean for an Applied Materials' TEOS PECVD Process: Reduced PFC Emissions and Faster Clean Times

Johnson, A.D., Entley, W.R., Vrtis, R.N., Langan, J., Maroulis, P., Chen, C.M., Chen, C.T., Chang, Y.C., Yam, O.H.

Electrochemical Society
10 国際会議録 Impact of Fluorine from NF3 Based Chamber Cleaning Processes

Brown, P.T., Mendicino, L., Vartanian, V.

Electrochemical Society
5 国際会議録 Reduction of PFC Emissions Through Process Advances in CVD Chamber Cleaning

Hsu, S., Allgood, C., Mocella, M.

Electrochemical Society
11 国際会議録 Risk-Based Evaluation of Bulk Anhydrous Hydrogen Chloride Delivery Alternatives Used in the Semiconductor Industry

Nauert, C., Brown, P.T.

Electrochemical Society
6 国際会議録 EHS Infrastructure Issues in Modern Wafer Fabs

Brown, P.T., Reblin, R., Heironimus, J., Nauert, C., Mendicino, L.

Electrochemical Society
12 国際会議録 PFC Emissions Reduction and Atomic Fluorine Generation Using C3F8 and Remote CVD Chamber Cleaning Technology

Zazzera, L., Kesari, S., Reagen, W., Tousignant, L., Holber, W., Chen, X.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12