Modular, High Performance BiCMOS by Integration of SiGe:C HBTs *

Modular, High Performance BiCMOS by Integration of SiGe:C HBTs *

著者名:

Knoll, D.

掲載資料名:

ULSI Process Integration : proceedings of the International Symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-2

発行年:

2001

開始ページ:

165

終了ページ:

177

総ページ数:

13

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773089 [1566773083]

言語:

英語

請求記号:

E23400/2001-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014006
シリーズID:	PA00000028
会議名:	International Symposium on ULSI Process Integration ; Meeting of the Electrochemical Society
回次:	2nd ; 199th
会議開催地:	Washington, D.C., USA
会議開催年:	2001.03.24-2001.03.31

類似資料:

1 国際会議録 Manufacturability of SiGe:C and Si Epitaxy for Heterojunction Bipolar Transistors integrated in a BiCMOS Technology Knoll, B. Tillack. D., Yamamoto, Y., Heine, B., Ehwald, nann; K.E., Winkler, W., Rucker, H. Electrochemical Society	7 国際会議録 INVITED: SiGeC DEVICE APPLICATIONS Osten, H.J. Electrochemical Society
2 国際会議録 BICMOS Integration of High-Speed SiGe:C HBTs* Rocker, H., Heinemann, B., Barth, R., Knoll, D., Schmidt, D., Winkler, W. Electrochemical Society	8 国際会議録 INVITED: SiGeC DEVICE APPLICATIONS Osten, H.J. Electrochemical Society
3 国際会議録 (2.1) 1:05 - 1:35 PM - Complementary SiGe BiCMOS (Invited) Heinemann, B., Drews, J., Knoll, D., Kurps, R., Marschmeyer, S., Rucker, H., Winkler, W., Yamamoto, Y.(IHP) Electrochemical Society	9 国際会議録 Investigating the differences in low-frequency noise behavior of npn and pnp SiGe HBTs fabricated in a complementary SiGe HBT BiCMOS on SOI technology Zhao, E., Krithivasan, R., Sutton, A. K., Jin, Z., Cressler, J. D., El-Kareh, B., Balster, S., Yasuda, H. SPIE - The International Society of Optical Engineering
4 国際会議録 Successful Preparation of High Frequency HBT by Integrated RTCVD Processes Ritter, G., Tillack, B., Knoll, D. MRS - Materials Research Society	10 国際会議録 SiGe Heteroepitaxy for High Frequency Circuits Tillack, B., Bolze, D., Fischer, G., Kissinger, G., Knoll, D., Ritter, G., Schley, P., Wolansky, D. MRS - Materials Research Society
5 国際会議録 High-frequency low-noise amplifiers and low-jitter oscillators in SiGe:C BiCMOS technology Winkler, W., Borngraber, J., Heinemann, B., Herzel, F., Scholz, R. F. SPIE - The International Society of Optical Engineering	11 国際会議録 Toward rf System-Level Integration: Process Integration Issues in SiGe BiCMOS Freeman, G., Schonenberg, K., Ahlgren, D., Jeng, S-J., Nguyen-Ngoc, D., Stein, K., Colavito, D., Subbanna, S., Harame, … MRS - Materials Research Society
6 国際会議録 Integration of Photonic Detectors in Standard SiGe HBT BiCMOS G. Meinhardt, J. Kraft, H. Zimmermann Electrochemical Society	12 国際会議録 Modular high-performance 2-µm CCD-BiCMOS process technology for application-specific image sensors and image sensor systems on a chip R.M. Guidash, P.P.K. Lee, J.M. Andrus, A.S. Ciccarelli, H.J. Erhardt Society of Photo-optical Instrumentation Engineers

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