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Low-Pressure CVD of Germanium-Silicon Films Using Silane and Germane Sources

著者名:
掲載資料名:
Thin Film Transistor Technologies V : proceedings of the International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-31
発行年:
2000
開始ページ:
269
終了ページ:
275
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772983 [1566772982]
言語:
英語
請求記号:
E23400/200031
資料種別:
国際会議録

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