Electron-Beam Induced Nanomasking for Metal Electrodeposition on Semiconductor Surfaces

Electron-Beam Induced Nanomasking for Metal Electrodeposition on Semiconductor Surfaces

著者名:

掲載資料名:

Pits and Pores : formation, properties, and significance for advanced materials : proceedings of the International Symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2000-25

発行年:

2000

開始ページ:

200

終了ページ:

211

総ページ数:

12

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772921 [1566772923]

言語:

英語

請求記号:

E23400/200025

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013994
シリーズID:	PA00000028
会議名:	International Symposium on Pits and Pores ; Meeting of the Electrochemical Society
回次:	2nd ; 198th
会議開催地:	Phoenix, AZ, USA
会議開催年:	2000.10.22-2000.10.27

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