Gate oxide Integrity Response as a Function of Near the Surface Crystal Defects Morphology
- 著者名:
Borionetti, G. Godio, P. Bonoli, F. Comara, M. Orizio, R. Falster, R. - 掲載資料名:
- High Purity Silicon VI : proceedings of the sixth International Symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-17
- 発行年:
- 2000
- 開始ページ:
- 456
- 終了ページ:
- 466
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772846 [1566772842]
- 言語:
- 英語
- 請求記号:
- E23400/200017
- 資料種別:
- 国際会議録
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12
国際会議録
Impact of silicon substrate oxygen precipitation fine tuning on high density memories retention time
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