Blank Cover Image

Effect of Aluminum on Oxide Growth and Oxide Charges in Silicon Wafers

著者名:
掲載資料名:
High Purity Silicon VI : proceedings of the sixth International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-17
発行年:
2000
開始ページ:
296
終了ページ:
304
総ページ数:
9
出版情報:
Bellingham, Wash.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772846 [1566772842]
言語:
英語
請求記号:
E23400/200017
資料種別:
国際会議録

類似資料:

1 国際会議録 Effect of Aluminum on Oxide Growth and Oxide Charges in Silicon Wafers

Shimizu,H., Ikeda,M., Munakata,C., Nagashima,N.

Electrochemical Society, SPIE-The International Society for Optical Engineering
7 国際会議録 Analyses of Au/Si Schottky Barrier-Induced AC Surface Photovoltages in N-Type Silicon Wafers Rinsed in Au Aqueous Solution

H. Shimizu, E. Omori, M. Ikeda

Electrochemical Society
2 国際会議録 Basic approaches for metal-induced oxide charge on silicon wafer surfaces studied by AC surface photovoltage techniques (Invited Paper)

Shimizu,H., Munakata,C.

SPIE-The International Society for Optical Engineering
8 国際会議録 AC PHOTOVOLTAIC INSPECTION OF P-N JUNCTIONS HAVING HIGH LEAKAGE CURRENT

Honma, N., Shimizu, H., Munakata, C., Ogasawara, M.

Materials Research Society
3 国際会議録 Metal-induced charge and growth rate of ultrathin thermal oxide films grown on Al-or Fe-contaminated Si(100)surfaces

Shimizu,H., Shull,A., Munakata,C.

SPIE-The International Society for Optical Engineering
9 国際会議録 Oxidation Saturation of SiGe Alloy on Silicon-on-Insulator Wafers

T. Shimura, M. Shimizu, S. Horiuchi, H. Watanabe, K. Yasutake

Electrochemical Society
4 国際会議録 Scanning photon microscope based on ac surface photovoltage:applications to nondestructive evaluation of metallic contaminants in silicon wafers

Shimizu,H., Munakata,C.

SPIE-The International Society for Optical Engineering
10 国際会議録 Application of a silicon-enriched nitride diaphragm to a condenser microphone

Shimizu,N., Yoshida,A., Ikeda,M., Aoki,S.

SPIE-The International Society for Optical Engineering
5 国際会議録 Determination of the Aluminum-Induced Oxide Charge by AC Surface Photovoltage Measurements in N-Type Silicon

Shimizu, H., Ikeda, M., Shin, R.

SPIE-The International Society for Optical Engineering
11 国際会議録 An AC Surface Photovoltage Diagnostic Technique for Nondestructive Detection of Metallic Contaminants in Silicon Wafers

Shimizu, H., Munukata, C.

Electrochemical Society
6 国際会議録 Determination of the Aluminum-Induced Oxide Charge by AC Surface Photovoltage Measurements in N-Type Silicon

Shimizu, H., Ikeda, M., Shin, R.

Electrochemical Society
12 国際会議録 THE EFFECT OF DOPANT CONCENTRATION ON THE NATIVE OXIDE GROWTH ON SILICON WAFER SURFACE

Ishimaru, Y., Yoshiki, M., Hatanaka, T.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12