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Oxygen Precipitation Behavior and its Optimum Condition for Internal Gettenng and Mechanical Strength in Epitaxial and Polished Silicon Wafers *

著者名:
Sueoka, K.
Akatsuka, M.
Onno, T.
Asayama, E.
Koike, Y.
Adachi, N.
Sadamitsu, S.
Katahama, H.
さらに 3 件
掲載資料名:
High Purity Silicon VI : proceedings of the sixth International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-17
発行年:
2000
開始ページ:
164
終了ページ:
179
総ページ数:
16
出版情報:
Bellingham, Wash.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772846 [1566772842]
言語:
英語
請求記号:
E23400/200017
資料種別:
国際会議録

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