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Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

著者名:
Valade, L.
deCaro, D.
Casellas, H.
Basso-Bert, M.
Faulmann, C.
Legros, I-P.
Gassoux, P.
Aries, L.
さらに 3 件
掲載資料名:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-13
発行年:
2000
開始ページ:
773
終了ページ:
780
総ページ数:
8
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
言語:
英語
請求記号:
E23400/200013
資料種別:
国際会議録

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