Simplified CMP Planarization Process Module for Shallow Trench Isolation Applications
- 著者名:
- 掲載資料名:
- CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-13
- 発行年:
- 2000
- 開始ページ:
- 579
- 終了ページ:
- 585
- 総ページ数:
- 7
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772785 [1566772788]
- 言語:
- 英語
- 請求記号:
- E23400/200013
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Study of integration issues in shallow trench isolation for deep submicron CMOS technologies
SPIE-The International Society for Optical Engineering |