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Numerical Simulation of Silicon Carbide Deposition in a Cold Wall CVD Reactor

著者名:
Chaix, G.
Dallet, A.
Matecki, M.
de Persis, S.
Wang, Y.
Teyssandier, F.
さらに 1 件
掲載資料名:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-13
発行年:
2000
開始ページ:
209
終了ページ:
215
総ページ数:
7
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
言語:
英語
請求記号:
E23400/200013
資料種別:
国際会議録

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