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Gas-Phase Chemistry in the CVD of Silicon Carbide: Theoretical Study of the Reactions SiH2+CH4, SiH2+C2H4, and SiH2+C2H2

著者名:
掲載資料名:
CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-13
発行年:
2000
開始ページ:
40
終了ページ:
50
総ページ数:
11
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772785 [1566772788]
言語:
英語
請求記号:
E23400/200013
資料種別:
国際会議録

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