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Exploring Alternative Annealing Methods for Shallow Junction Formation in Ion Implanted Silicon

著者名:
Jones, K.S.
Banisaukis, H.
Earles, S.
Lindfors, C.
Griglione, M.
Law, M.E.
Taiwar, S.
Falk, S.W.
Downey, D.F.
Agarwal, A.
さらに 5 件
掲載資料名:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-9
発行年:
2000
開始ページ:
119
終了ページ:
128
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
言語:
英語
請求記号:
E23400/2000-9
資料種別:
国際会議録

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