Novel STI CMP Process Using Highly Selective Ceria Slurry with Thin Nitride Stopper

Novel STI CMP Process Using Highly Selective Ceria Slurry with Thin Nitride Stopper

著者名:

掲載資料名:

Electrochemical processing in ULSI fabrication III : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2000-8

発行年:

2000

開始ページ:

227

終了ページ:

233

総ページ数:

7

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772730 [1566772737]

言語:

英語

請求記号:

E23400/2000-8

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013977
シリーズID:	PA00000028
会議名:	Symposium on Electrochemical Processing in ULSI Fabrication ; Meeting of the Electrochemical Society
回次:	3rd ; 197th
会議開催地:	Toronto, Canada
会議開催年:	2000.05.14-2000.05.19

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