Blank Cover Image

The Integration of PECVD BPSG Films as a Pre-Metal Dielectric

著者名:
掲載資料名:
Plasma processing XIII : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-6
発行年:
2000
開始ページ:
13
終了ページ:
33
総ページ数:
21
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772716 [1566772710]
言語:
英語
請求記号:
E23400/2000-6
資料種別:
国際会議録

類似資料:

1 国際会議録 Instability of Chemical Composition in PECVD BPSG film

Y.V. Sokolov, Q. Wang

Electrochemical Society
7 国際会議録 Thermal Stability of Sputtered Ta/PECVD SiOF Films for Intermetal Dielectric Applications

Kim, K., Park, S., Lee, G.S.

Electrochemical Society
2 国際会議録 The Hot Carrier Degradation and Device Characteristics With Variation of Pre-Metal Dielectric Materials

Seo, Y. J., Choi, W. S., Kim, S. Y., Kim, C. I., Chang, E. G., Lee, W. S.

MRS - Materials Research Society
8 国際会議録 Integration of BPSG in a 0.25 mm DRAM Process

Gambino, J.P., Jaso, M.A., Aochi, H., Tsunashima, Y., Peschke, M., Bronne, G.B.

Electrochemical Society
3 国際会議録 Femtosecond breakdown and pre-breakdown behavior in thin dielectric films

Mero, M., Liu, J., Sabbah, A.J., Zeller, J., Rudolph, W.G., Starke, K., Ristau, D.

SPIE - The International Society of Optical Engineering
9 国際会議録 Stress Control of Si-Based PECVD Dielectrics

Mackenzie, K.D., Johnson, D.J., DeVre, M.W., Westerman, R.J., Reelfs, B.H.

Electrochemical Society
4 国際会議録 Advances in the Methods for Characterization of BPSG Films

R. Carpio, G.P. Lamaze, R.G. Downing

Electrochemical Society
10 国際会議録 Simulation, Fabrication and Characterization of a Tunable Bragg Reflector Based on Silicon Oxide and Silicon Nitride Dielectric Films Deposited by PECVD

G. S. Martins, H. Baez, M. I. Alayo

Electrochemical Society
5 国際会議録 ENHANCED ADHESION OF COPPER FILMS TO SiO2, PSG AND BPSG BY REFRACTORY METAL ADDITIONS

Rafalski, S. A., Spreitzer, R. L., Russell, S. W., Alford, T. L., Li, J., Moinpour, M., Moghadam, F., Mayer, J. W.

MRS - Materials Research Society
11 国際会議録 Challenges in Integration of Metal Gate High-k Dielectrics Gate Stacks

Tsai, W., Ragnarrson, L.-A., Schram, T., DeGendt, S., Heyns, M.

Electrochemical Society
6 国際会議録 Retrieval of the photo-induced changes of the dielectric function of thin films in the pre-ablation regime

Mero, M., Jasapara, J.C., Rudolph, W.G.

SPIE-The International Society for Optical Engineering
12 国際会議録 PECVD of SiOx Barrier Films

A.W. Smith, N. Copeland, D. Gerrerd, D. Nicholas

Society of Vacuum Coaters
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12