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Ammonia Plasma Passivation Effects on Properties of Post-CMP Low-k Hydrogen Silsesquioxane (HSQ)

著者名:
Chang, T.-C. ( (National Sun Yat-Sen University) )
Liu, P.-T. ( (National Chiao Tung University) )
Tsai, T.-M. ( (National Tsing Hua University) )
Chang, C.-F. ( (National Chiao Tung University) )
Yang, Y.-L. ( (National Nano Device Laboratory) )
Sze, S.M. ( (National Chiao Tung University) )
Shih, F.Y. ( (Dow Coring Taiwan Inc.) )
Tsai, E. ( (Dow Coring Taiwan Inc.) )
Chen, G. ( (Dow Coring Taiwan Inc.) )
Lee, J.K. ( (Dow Coring Taiwan Inc.) )
さらに 5 件
掲載資料名:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-5
発行年:
2000
開始ページ:
133
終了ページ:
143
総ページ数:
11
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
言語:
英語
請求記号:
E23400/2000-5
資料種別:
国際会議録

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