Enhancement of Organic Low-k Hybrid-Organic-SiloXane-Polymer (HOSP) in Resisting Oxygen Plasma Process
- 著者名:
Chang, T.-C. ( (National Sun Yat-Sen University) ) Liu, P.-T. ( (National Chiao Tung University) ) Su, H. ( (National Chiao Tung University) ) Chang, C.-F. ( (National Chiao Tung University) ) Yang, Y.-L. ( (National Nano Device Laboratory) ) Sze, S.M. ( (National Nano Device Laboratory) ) Hou, J. ( (Allied Signal inc. Taiwan) ) Chung, H. ( (Allied Signal inc. Taiwan) ) - 掲載資料名:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-5
- 発行年:
- 2000
- 開始ページ:
- 72
- 終了ページ:
- 89
- 総ページ数:
- 18
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- 言語:
- 英語
- 請求記号:
- E23400/2000-5
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
7
国際会議録
Characteristics of Low-k Methyl-Silsesquiazane (MSZ) for CMP Process Using Oxygen Plasma Treatment
Electrochemical Society |
2
国際会議録
Ammonia Plasma Passivation Effects on Properties of Post-CMP Low-k Hydrogen Silsesquioxane (HSQ)
Electrochemical Society |
Trans Tech Publications |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
MRS - Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |