Integration Issues for New Dielectrics in CMOS Technology
- 著者名:
Gates, S. ( (IBM) ) Chen, S.T. ( (IBM) ) Chen, X. ( (IBM) ) Cohen, S. ( (IBM) ) Edelstein, D. ( (IBM) ) Fitzsimmons, J. ( (IBM) ) Hedrick, J. ( (IBM) ) Restaino, D. ( (IBM) ) Ryan, J. ( (IBM) ) Simonyi, E. ( (IBM) ) Purushothaman, S. ( (IBM) ) - 掲載資料名:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-5
- 発行年:
- 2000
- 開始ページ:
- 31
- 終了ページ:
- 39
- 総ページ数:
- 9
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- 言語:
- 英語
- 請求記号:
- E23400/2000-5
- 資料種別:
- 国際会議録
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3
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