Three-Dimensional Chemical Mechanical Polishing Process by BEM | 東京工業大学附属図書館文献データベース

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Three-Dimensional Chemical Mechanical Polishing Process by BEM

著者名:: Yoshida, Takafumi
掲載資料名:: Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
シリーズ名:: Electrochemical Society Proceedings Series
シリーズ巻号:: 99-37
発行年:: 1999
開始ページ:: 593
終了ページ:: 604
総ページ数:: 12
出版情報:: Pennington, N. J.: Electrochemical Society
ISSN:: 01616374
ISBN:: 9781566772600 [1566772605]
言語:: 英語
請求記号:: E23400/99-37
資料種別:: 国際会議録

詳細

TDL書誌ID:	ZA00013965
シリーズID:	PA00000028
会議名:	International Symposium on Chemical Mechanical Planarization ; Meeting of the Electrochemical Society ; Fall Meeting of the Electrochamical Society of Japan
回次:	3rd ; 196th ; 1999
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.20-1999.10.22

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