A Few Thoughts on the Alleviation of Dishing and Erosion during Chemical-Mechanical Planarization for Shallow Trench Isolation
- 著者名:
- 掲載資料名:
- Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-37
- 発行年:
- 1999
- 開始ページ:
- 71
- 終了ページ:
- 82
- 総ページ数:
- 12
- 出版情報:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772600 [1566772605]
- 言語:
- 英語
- 請求記号:
- E23400/99-37
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
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4
国際会議録
Slurry Dispersion and Frictional Behaviors during Chemical-Mechanical Polishing of Silicon Dioxide
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12
国際会議録
STUDY OF CHEMICAL MECHANICAL POLISHING ON STI(SHALLOW TRENCH ISOLATION)TO OBTAIN LOW DEFECT
Electrochemical Society |