APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
- 著者名:
Wolke, K. Riedel, T. Haug, R. De Gendt, S. Heyns, M.M. Meuris, M. - 掲載資料名:
- Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-36
- 発行年:
- 1999
- 開始ページ:
- 204
- 終了ページ:
- 211
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772594 [1566772591]
- 言語:
- 英語
- 請求記号:
- E23400/99-36
- 資料種別:
- 国際会議録
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12
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VAPOR PHASE DECOMPOSITION - DROPLET COLLECTION EVALUATION OF A WAFER SURFACE PREPARATION SYSTEM
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