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THE EFFECT OF COPPER CONTAMINATION FROM HF AND APM ON THE INTEGRITY OF 3 NM GATE OXIDES

著者名:
掲載資料名:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-36
発行年:
1999
開始ページ:
69
終了ページ:
76
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772594 [1566772591]
言語:
英語
請求記号:
E23400/99-36
資料種別:
国際会議録

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