ON-PRODUCT EVALUATION OF WAFER-SURFACE PRECLEAN PROCESSES ON CMOS GATE-OXIDE INTEGRITY
- 著者名:
- 掲載資料名:
- Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-36
- 発行年:
- 1999
- 開始ページ:
- 51
- 終了ページ:
- 58
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772594 [1566772591]
- 言語:
- 英語
- 請求記号:
- E23400/99-36
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society, SPIE-The International Society for Optical Engineering |
Electrochemical Society |
10
国際会議録
Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity
MRS - Materials Research Society |
5
国際会議録
Influence of Various Factors on the COP-Related Gate Oxide Integrity Degradation of Si Wafers
SPIE - The International Society for Optical Engineering |
11
国際会議録
Organic Contamination of Silicon Wafer in Clean Room Air and Its Impact to Gate Oxide Integrity
MRS - Materials Research Society |
6
国際会議録
Organic Contamination on Si Wafers in Fab Environments and its Effects on Gate Oxide Integrity
Electrochemical Society |
Electrochemical Society |