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Effects of Chloride Ion on Copper Deposition into Porous Silicon

著者名:
Sasano, J.
Jorne, J.
Yoshimi, N.
Tsuboi, T.
Sakka, T.
Ogata, Y.H.
さらに 1 件
掲載資料名:
Fundamental aspects of electrochemical deposition and dissolution : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-33
発行年:
1999
開始ページ:
84
終了ページ:
90
総ページ数:
7
出版情報:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772563 [1566772567]
言語:
英語
請求記号:
E23400/99-33
資料種別:
国際会議録

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