The Nucleation and Growth of Electrochemically Deposited Copper on PVD Copper and TiN using Alkaline (EDTA and NH 3) Baths

The Nucleation and Growth of Electrochemically Deposited Copper on PVD Copper and TiN using Alkaline (EDTA and NH 3) Baths

著者名:

掲載資料名:

Fundamental aspects of electrochemical deposition and dissolution : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-33

発行年:

1999

開始ページ:

27

終了ページ:

37

総ページ数:

11

出版情報:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772563 [1566772567]

言語:

英語

請求記号:

E23400/99-33

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013961
シリーズID:	PA00000028
会議名:	Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution
回次:	1999
会議開催地:	Honolulu, HI, USA
会議開催年:	1999.10.00

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