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Elementary Reaction Simulation of Al-CVD Using Dimethyl Aluminum Hydride

著者名:
Sugiyama, M.
Nakajima, T.
Tanaka, T.
Itoh, H.
Aoyama, J.
Egashira, Y.
Yamashita, K.
Komiyama, H.
Shimogaki, Y.
さらに 4 件
掲載資料名:
Interconnect and contact metallization for ULSI : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-31
発行年:
1999
開始ページ:
56
終了ページ:
67
総ページ数:
12
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772549 [1566772540]
言語:
英語
請求記号:
E23400/99-31
資料種別:
国際会議録

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