Fabrication of Sub-0.1 um Contacts with 193 nm CARL Photo- Lithography by a Combination of ICP Dry Development and MORI HDP Oxide Etch
- 著者名:
Song, V. Watson, A. Thomas, D. Powell, K. Raske, H.E. Domke, W.O. Sebald, M. - 掲載資料名:
- Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-30
- 発行年:
- 1999
- 開始ページ:
- 226
- 終了ページ:
- 232
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772532 [1566772532]
- 言語:
- 英語
- 請求記号:
- E23400/99-30
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |