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Low Temperature Plasma Treatment of Ta2O5 Films for W Electrode Metal-Insulator-Metal (MIM) Capacitor

著者名:
掲載資料名:
ULSI process integration : proceedings of the first international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-18
発行年:
1999
開始ページ:
177
終了ページ:
180
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772419 [1566772419]
言語:
英語
請求記号:
E23400/99-18
資料種別:
国際会議録

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