Shallow Junction Fabrication by Rapid Thermal Outdiffusion from Implanted Oxide
- 著者名:
Schmirz, I. van Gestel, M. Stolk, P.A. Pononarev, Y.V. Roozeboo, F. Cohayncs, F.N. van Berkum, I.G.M. van de Wijgert, W.M. Zahn, P.C. Woerlee, P.H. - 掲載資料名:
- Advances in rapid thermal processing : proceedings of the symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-10
- 発行年:
- 1999
- 開始ページ:
- 187
- 終了ページ:
- 194
- 総ページ数:
- 8
- 出版情報:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772327 [156677232X]
- 言語:
- 英語
- 請求記号:
- E23400/99-10
- 資料種別:
- 国際会議録
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3
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Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon
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