Impact of Fluorine from NF3 Based Chamber Cleaning Processes

Impact of Fluorine from NF3 Based Chamber Cleaning Processes

著者名:

Brown, P.T. ( Motorola )
Mendicino, L. ( Motorola )
Vartanian, V. ( Motorola )

掲載資料名:

Environmental issues in the electronics and semiconductor industries : proceedings of the second international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-8

発行年:

1999

開始ページ:

52

終了ページ:

59

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772303 [1566772303]

言語:

英語

請求記号:

E23400/99-8

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013938
シリーズID:	PA00000028
会議名:	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
回次:	2nd ; 195th
会議開催地:	Seattle, WA, USA
会議開催年:	1999.05.00

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1 国際会議録 Fate of Fluorine Emissions from NF3-Based CVD Chamber Cleaning Process Vartanian, V., Goolsby, B., Mendicino, L., Brown, PT., Vires, J., Raley, D. Babbittand B. Electrochemical Society	7 国際会議録 Remote Plasma Clean Technology for Dielectric CVD Chamber Cleaning to Reduce PFC Emissions Mendicino, L., Brown, P.T., Filipak, S., Loop, D., Basnett, R., Holber, W., Pearce, R., Johnson, A. Electrochemical Society
2 国際会議録 Point of Use Abatement Unit By-Pass for NF3-Based CVD Chamber Clean Applications Babbitt, D., Mendicino, L., Vartanian, V., Goolsby, B., Brown, P.T. Electrochemical Society	8 国際会議録 The Environmental and Cost of Ownership Impacts of Two Wet Clean Tools Brown, P.T., Covington, J., McCormack, K., McDonald, J., Mendicino, L., Rhodes, K., Ladigo, V. Electrochemical Society
3 国際会議録 Continuous Real-Time Detection of Molecular Fluorine (F2) Emitted as a By-Product Of CVD and Etch Processes Laush, C., Vartanian, V., Mendicino, L., Brown, P.T. Electrochemical Society	9 国際会議録 The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber Chatterjee, R., Reif, R., Sparks, I., Vartanian, V., Goolsby, B., Mendicino, L. Electrochemical Society
4 国際会議録 Characterization and Abatement of Emissions from Advanced CVD Processes Mendicino, L., Vartanian, V., Gonlsby, B., Brown, P.T., Reid, K., Van Gompel, J. Electrochemical Society	10 国際会議録 FTIR Analysis of a New High K Gate Material for MOCVD Applications Reid, K., Mendicino, L., Cole, V., Brown, P., Vartanian, V. Electrochemical Society
5 国際会議録 PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans Mendicino, L., Brown, P.T., Filipiak, S., Nauert, C., Estep, H., Fletcher, M. Electrochemical Society	11 国際会議録 Point of Use Abatement for CVD Precursors and Reaction Products Mendicino, L., Brown, P., Vartanian, V., Reid, K., Van Gompel, J. Electrochemical Society
6 国際会議録 Characterization of NF3 Chamber Cleans on Multiple CVD Platforms Goolsby, B., Vartanian, V., Mendicino, L., Rivers, J., Vires, J., Soyemi, A., Sun, S.P., Turner, M., Esber, C. Electrochemical Society	12 国際会議録 Copper Removal from Chemical Mechanical Polishing Effluent Riley, C., Filson, J., Mendicino, L., Brown, P.T. Electrochemical Society

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